Device Description:
The equipment is a physical vapor deposition (PVD) vacuum coating equipment developed with reference to foreign advanced technology. It can simultaneously install two or four different pure metal or alloy targets for single or multi-layer (nano) film plating. system...
Device Description:
The equipment is a physical vapor deposition (PVD) vacuum coating equipment developed with reference to foreign advanced technology. It can simultaneously install two or four different pure metal or alloy targets for single or multi-layer (nano) film plating. system. Applicable to all kinds of drills, milling cutters, gear cutters, broaches, taps, scissors, scraping blades, molds, injection molds, magnetic powder forming molds, punching and shearing molds, etc. Through the modification of the surface of the workpiece in physical, chemical, mechanical, color, etc., the effect of wear resistance, super hard and self-lubrication is achieved.
main feature:
1. Using a reactive gas source to assist deposition, pre-cleaning the workpiece and assisting deposition during coating;
2. Using a high-power pulse-biased power supply to achieve better bonding between the workpiece and the film layer;
3. Using multiple sets of twin targets and arcs, 2~4 different pure metal or alloy targets can be installed at the same time to obtain composite nano-coating;
4. The workpiece frame adopts the male and self-rotating structure, has strong bearing capacity and high temperature resistance, and can be moved out of the cavity to facilitate loading and unloading relatively heavy molds;
5. touch screen + PLC, can achieve automatic control, automatic / manual switch at any time.
| JYD series hard film layer (knife milling tool) vacuum coating machine Model and technical parameters |
|||
| Performance | JYDC-9010 | JYDC-1012 | JYDC-1214 |
| Coating chamber size | Ф900×H1000mm | Ф1000×H1200mm | Ф1200×H1400mm |
| Power type | Pulse bias power supply, arc target power supply, pulsed arc target power supply, ionization power supply | ||
| Vacuum chamber structure | Vertical front door single door, double door structure, rear suction system, horizontal, barrel plating, side suction system | ||
| Vacuum chamber material | Fully high quality stainless steel, double chamber | ||
| Ultimate vacuum | 8.0X10-4Pa | ||
| Pumping time | Pumped from the atmosphere to 8.0×10-3Pa≤16 minutes (no load)） | ||
| Vacuum acquisition system | Diffusion pump or molecular pump + Roots pump + mechanical pump + maintenance pump (specific models can be configured according to customer requirements) | ||
| Film type | Metal film, reaction film, compound film, multilayer film, semiconductor film, super hard film | ||
| Multi-arc target type | Round 60-100 arc target, rectangular arc target, cylindrical arc target, electromagnetic arc target | ||
| Arc power and arc target | Optional according to different coating processes and customer needs | ||
| Bias power supply | 30KW/1 set | 40KW/1 set | 50KW/1 set |
| Workpiece turret Rotation mode |
Planetary public rotation, frequency control (controllable and adjustable) | ||
| Process gas | 3-way or 4-way process gas flow control and display system Optional automatic gas filling system | ||
| cooling method | The water circulation cooling method requires a cooling tower or an industrial chiller or a deep cooling system. (provided by the customer) | ||
| control method | Manual/automatic integration, touch screen operation, PLC or computer control | ||
| Total power of the whole machine | 55KW | 70KW | 90KW |
| Alarm and protection | Alarms such as water shortage, over-current over-voltage, and open circuit such as pumps and targets are alarmed, and corresponding protective measures and electrical interlocking functions are implemented. | ||
| Equipment footprint | W2m×L3m | W3m×L4m | W4.5m×L6m |
| Other technical parameters | Water pressure ≥0.2MPa, water temperature ≤25°C, air pressure 0.5-0.8MPa | ||
| Other models | We can design a special coating machine for the products according to customer needs. | ||
